Nagaokakyo, Japan

Masaru Amano

This inventor holds 1 USPTO granted patent. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaru Amano. Retrieved from https://idiyas.com/inventor/masaru-amano-cy80nblz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Masaru Amano: Innovator in Cleaning Technology

Introduction

Masaru Amano is a notable inventor based in Nagaokakyo, Japan. He has made significant contributions to the field of cleaning devices, showcasing his innovative spirit through his patented inventions.

Latest Patents

Amano holds a patent for a cleaning device, which includes an imaging unit and a cleaning method. This device utilizes a signal processing circuit to determine the presence of foreign substances on the surface of a protection cover. It does this by analyzing at least two pieces of information, including changes in resonant frequency and current values related to impedance. The device effectively cleans the surface by controlling the vibration portion based on its determinations.

Career Highlights

Masaru Amano is associated with Murata Manufacturing Co., Ltd., a company known for its advancements in electronic components. His work there has allowed him to focus on innovative cleaning technologies that enhance the functionality of imaging units.

Collaborations

Amano has collaborated with notable colleagues, including Noritaka Kishi and Hitoshi Sakaguchi. Their combined expertise contributes to the development of cutting-edge technologies in their field.

Conclusion

Masaru Amano's contributions to cleaning technology exemplify his innovative approach and dedication to improving device functionality. His patent reflects a significant advancement in the industry, showcasing the potential for further developments in cleaning devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…