Tokyo, Japan

Masaomi Ohno

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaomi Ohno. Retrieved from https://idiyas.com/inventor/masaomi-ohno-dj8n3ly3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Masaomi Ohno: Inventor of an Electronic Cleaning Device.

Introduction

Masaomi Ohno is an inventor based in Tokyo, Japan, associated with Hitachi High-Tech Corporation. His patent work includes an electronic cleaning device designed to reduce contamination inside a sample chamber.

Latest Patents

Ohno is named on one patent, titled “Electronic Cleaning Device.” The invention addresses contamination caused when electron irradiation dissociates hydrocarbon gas, depositing carbon on components inside a sample chamber and on the sample surface. The device includes a sample chamber connected to a lens barrel containing a charged-particle source, an electron source inside the chamber, and a shield plate positioned in front of the electron source. Primary electrons strike the shield plate, producing secondary electrons that clean the chamber’s interior.

Career Highlights

Ohno’s listed patent reflects work on electron-based cleaning technology for charged-particle equipment. The approach uses secondary electrons to help remove contamination from the sample chamber.

Collaborations

Ohno’s listed coworkers include Yuto Kubonaka and Koichiro Takeuchi. His patent is associated with Hitachi High-Tech Corporation.

Conclusion

Masaomi Ohno’s patent describes a practical method for cleaning sample chambers with secondary electrons, addressing contamination in charged-particle equipment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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