Sayama, Japan

Masao Koshi

This inventor holds 2 USPTO granted patents. Top assignee: Citizen Watch Company, Ltd.. Active years: 1984-1986.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1984-1986

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2 patents (USPTO):Explore Patents

Title: Masao Koshi: Innovator in Ion Plating Technology

Introduction

Masao Koshi is a notable inventor based in Sayama, Japan. He has made significant contributions to the field of ion plating technology, holding 2 patents that enhance the precision and efficiency of thin film deposition processes.

Latest Patents

Koshi's latest patents include a method of sensing the amount of a thin film deposited during an ion plating process. This method involves either fixing the voltage applied to a plasma-generating probe and measuring the current flowing through it, or fixing the current and measuring the voltage developed at the probe. The results of these measurements can be utilized to control the thickness of the deposited thin film to a desired value. Another patent focuses on methods and coating materials by ion plating. This innovation employs an ion plating apparatus with independently operable ionizing means, allowing for enhanced control over the bombardment effect during the ion plating process. This technique facilitates the production of relatively thick and adherent coatings.

Career Highlights

Masao Koshi is associated with Citizen Watch Company, Ltd., where he applies his expertise in ion plating technology. His work has contributed to advancements in the manufacturing processes of various products.

Collaborations

Koshi has collaborated with notable coworkers, including Mitsugu Enomoto and Youji Yoshikawa, who have also contributed to the field of ion plating.

Conclusion

Masao Koshi's innovations in ion plating technology demonstrate his commitment to advancing manufacturing processes. His patents reflect a deep understanding of the complexities involved in thin film deposition, making him a significant figure in this field.

Profile summary based on public USPTO records.
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