Masami Otani

Masami Otani is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 3 patents to his name, Otani's work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is a substrate processing apparatus and method that includes obstacle detection. This innovative device features a camera fixed to a camera fixture that extends forward and upward from the rear end of an arm mechanism. The camera captures the direction of extension of the arm mechanism when the substrate is carried in and out. If a normal still image recorded in a hot plate unit coincides with a still image captured by the camera, a substrate transport robot carries in and out the substrate. Another significant patent is a wafer transferring device designed for transferring a wafer to be treated from a wafer supply station to a wafer holding member. This device includes a transfer unit that supports untreated and treated wafers at different heights and a carrier unit that moves horizontally and reciprocates between the supply and discharge stations.

Career Highlights

Masami Otani is currently employed at Dainippon Screen Mfg. Co., Ltd., where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the efficiency and effectiveness of wafer processing.

Collaborations

Otani has collaborated with several talented individuals in his field, including Masahiro Himoto and Akio Tsuchiya. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Masami Otani's contributions to substrate processing technology are noteworthy and reflect his dedication to innovation. His patents demonstrate a commitment to improving industry standards and practices.