Masaki Sugie

Title: Masaki Sugie: Innovator in Overlay Measurement Technology

Introduction

Masaki Sugie is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of overlay measurement technology. His innovative work has led to the development of a unique patent that addresses critical challenges in the measurement of overlay errors.

Latest Patents

Masaki Sugie's latest patent is titled "Overlay measurement system and overlay measurement device for overlay error measurement using electron microscopy." This invention enables the measurement of overlay errors between processors from a pattern image, even when the signal-to-noise (SN) ratio is low. The system forms a secondary electron image from a detection signal of a secondary electron detector and a reflected electron image from a detection signal of a reflected electron detector. It creates a SUMLINE profile by adding luminance information in the reflected electron image along the longitudinal direction of a line pattern. The overlay error of a sample is calculated using position information about an upper layer pattern detected from the secondary electron image and position information about a lower layer pattern estimated based on the SUMLINE profile from the reflected electron image.

Career Highlights

Masaki Sugie has made significant strides in his career, particularly through his work at Hitachi High-Tech Corporation. His expertise in electron microscopy and overlay measurement systems has positioned him as a key figure in advancing measurement technologies.

Collaborations

Masaki has collaborated with Kei Sakai, contributing to the development of innovative solutions in the field of overlay measurement.

Conclusion

Masaki Sugie's contributions to overlay measurement technology exemplify the impact of innovation in the field of electronics. His work continues to influence advancements in measurement systems, showcasing the importance of precision in technology development.