The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Aug. 23, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Masaki Sugie, Tokyo, JP;
Kei Sakai, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
The present invention enables an overlay error between processors to be measured from a pattern image, the SN ratio of which is low. To this end, the present invention forms a secondary electron imagefrom a detection signal of a secondary electron detector, forms a reflected electron imagefrom a detection signal of a reflected electron detector, creates a SUMLINE profilethat is obtained by adding luminance information in the reflected electron image along the longitudinal direction of a line pattern, and calculates an overlay error of a sample by using position information about an upper layer pattern detected from the secondary electron image and position information about a lower layer pattern that is detected by using an estimation line patternestimated on the basis of the SUMLINE profile from the reflected electron image.