Sayama, Japan

Masaki Ohkawara

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Shinkawa. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaki Ohkawara. Retrieved from https://idiyas.com/inventor/masaki-ohkawara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Masaki Ohkawara: Innovator in Wafer Die Pick-Up Methods

Introduction

Masaki Ohkawara is a notable inventor based in Sayama, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of die pick-up methods. His innovative approach has led to the development of a unique patent that enhances the efficiency of detecting and picking up dies from wafers.

Latest Patents

Ohkawara holds a patent for a wafer die pick-up method. This method involves detecting and picking up dies from a wafer by shifting the die detection and pick-up movement when a defective die is identified. The process ensures that non-defective dies are successfully detected and picked up, thereby improving the overall yield in semiconductor production.

Career Highlights

Masaki Ohkawara is associated with Kabushiki Kaisha Shinkawa, a company known for its advancements in semiconductor manufacturing technology. His work has been instrumental in refining processes that are critical to the industry.

Collaborations

Ohkawara collaborates with Nobuyuki Aoyagi, contributing to the development of innovative solutions in their field. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Masaki Ohkawara's contributions to wafer die pick-up methods reflect his dedication to innovation in semiconductor technology. His patent showcases a practical solution that enhances efficiency in the manufacturing process.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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