Masakazu Shiinoki

Title: Masakazu Shiinoki: Innovator in Semiconductor Technology

Introduction

Masakazu Shiinoki is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

One of his latest patents is an infrared radiation sensor. This invention simplifies the wiring pattern of semiconductor devices and allows for etching through an etching hole, creating a concavity in a short time period. The design includes a dielectric film that shields the concavity formed on the upper surface of a silicon substrate. Additionally, a circuit pattern featuring a thermoelectric conversion element is formed on the dielectric film. The upper surface of the silicon wafer is designed to be a (100) surface, with a first etching hole extending in the <110> direction and a second etching hole extending in the <−110> direction. These holes intersect in a cross shape, and their shapes become parallelograms with oblique sides tilted with respect to <110> and <−110>. The rapid etching at the intersecting part is facilitated by the appearance of (411) surfaces.

Career Highlights

Masakazu Shiinoki has built a successful career at Omron Corporation, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing the technology used in various electronic devices.

Collaborations

He has collaborated with notable coworkers, including Mitsuru Fujii and Tomohiro Kataoka, contributing to the development of cutting-edge technologies in their field.

Conclusion

Masakazu Shiinoki's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in electronic devices and semiconductor applications.