Company Filing History:
Years Active: 2009
Title: The Innovations of Masakazu Sano
Introduction
Masakazu Sano is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to advancements in the production of silicon wafers, which are essential components in various electronic devices.
Latest Patents
Masakazu Sano holds a patent for a manufacturing method of silicon wafers. This method involves heat-treating an active layer side silicon wafer in an oxidizing atmosphere to form a buried oxide film. The active layer side silicon wafer is then bonded to a supporting side wafer with the buried oxide film interposed, resulting in the fabrication of a Silicon-On-Insulator (SOI) wafer. The oxidizing heat treatment is conducted under specific conditions that satisfy the formula: [Oi] ≤ 2.123 × 10^(-T + 273), where T represents the temperature of the heat treatment and [Oi] is the interstitial oxygen concentration.
Career Highlights
Masakazu Sano is currently employed at Sumitomo Mitsubishi Silicon Corporation. His work has been pivotal in enhancing the efficiency and quality of silicon wafer production. His expertise in this area has positioned him as a key figure in the semiconductor industry.
Collaborations
Masakazu has collaborated with notable colleagues, including Shigeru Umeno and Masataka Hourai. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Masakazu Sano's contributions to the field of semiconductor manufacturing through his innovative patent have made a lasting impact. His work continues to influence the development of advanced technologies in the electronics sector.