Aichi, Japan

Masakazu Motoi

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masakazu Motoi. Retrieved from https://idiyas.com/inventor/masakazu-motoi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Masakazu Motoi: Innovator in Etching Technology

Introduction

Masakazu Motoi is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of etching technology, particularly with his innovative methods and solutions. His work focuses on improving the efficiency and effectiveness of etching processes, which are crucial in various manufacturing applications.

Latest Patents

Masakazu Motoi holds a patent for an etching method and etching liquid. This invention allows for the etching of a silver or silver alloy thin layer on a substrate uniformly, without producing etching residue. The etching liquid contains silver ions in a range from 0.005 to 1 weight percent. This method effectively avoids side etching due to over etching, enhancing the overall quality of the etching process.

Career Highlights

Throughout his career, Masakazu Motoi has demonstrated a commitment to innovation in etching technology. His patent reflects his expertise and dedication to advancing manufacturing techniques. His work has implications for various industries that rely on precise etching methods.

Collaborations

Masakazu Motoi has collaborated with notable colleagues, including Noriyuki Saitou and Toshiaki Sakakihara. These collaborations have likely contributed to the development and refinement of his innovative etching methods.

Conclusion

Masakazu Motoi is a distinguished inventor whose work in etching technology has made a significant impact. His patented methods enhance the efficiency of etching processes, showcasing his innovative spirit and dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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