Masahiko Kishimoto

Title: Innovations of Masahiko Kishimoto

Introduction

Masahiko Kishimoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of engineering, particularly in the development of advanced substrate holding apparatuses. With a total of five patents to his name, Kishimoto's work has had a notable impact on polishing technologies.

Latest Patents

Kishimoto's latest patents include a substrate holding apparatus, an elastic membrane, and a polishing apparatus. The substrate holding apparatus is designed to adjust the polishing profile precisely. It features an elastic membrane that forms multiple pressure chambers for pressing a substrate. The head body is coupled to the elastic membrane, which includes a contact portion that presses the substrate against a polishing pad. Additionally, the apparatus has an edge circumferential wall and several inner circumferential walls that are arranged radially inwardly. Notably, at least two adjacent inner circumferential walls include slope circumferential walls that are inclined radially inwardly, enhancing the apparatus's functionality.

Career Highlights

Kishimoto has been instrumental in advancing polishing technologies through his innovative designs. His work at Ebara Corporation has allowed him to collaborate with other talented engineers and researchers in the field. His patents reflect a deep understanding of the mechanics involved in substrate processing.

Collaborations

Some of Kishimoto's notable coworkers include Makoto Fukushima and Osamu Nabeya. Their collaborative efforts have contributed to the successful development of various technologies within the company.

Conclusion

Masahiko Kishimoto's contributions to the field of engineering, particularly in polishing technologies, are commendable. His innovative patents and collaborative work at Ebara Corporation highlight his dedication to advancing the industry.