Tokyo, Japan

Masaharu Kobayashi

This inventor holds 42 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Structures. Top assignees: International Business Machines Corporation, Sony Corporation, Japan Science and Technology Agency. Active years: 1983-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaharu Kobayashi. Retrieved from https://idiyas.com/inventor/masaharu-kobayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 42 

% Patents Active = 59.5

Average Co-Inventor Count = 2.7

ph-index = 8

Forward Citations = 193(Granted Patents)


Location History:

  • Ohmiya, JP (1983 - 1990)
  • Omiya, JP (1989 - 1990)
  • Yorktown Heights, NY (US) (2013 - 2017)
  • Tokyo, JP (1989 - 2023)

Company Filing History:


Years Active: 1983-2025

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Areas of Expertise:
Deep Trench Capacitor
FinFET Technology
Ferroelectric Memory
Self-Forming Spacers
Transistor Formation
Selective Dopant Junction
III-V Semiconductor
Compound Semiconductor
Process Variability Tolerance
Epitaxial Semiconductor
Ge-Containing Fins
Integrated Circuit
42 patents (USPTO):Explore Patents

Title: Masaharu Kobayashi - Innovator in Ferroelectric Memory Technology

Introduction

Masaharu Kobayashi, based in Tokyo, Japan, is an accomplished inventor with an impressive portfolio of 41 patents. His work primarily focuses on advancing semiconductor technology, particularly in the fields of ferroelectric memory devices and integrated circuit structures.

Latest Patents

Kobayashi's recent innovations include groundbreaking patents such as the "Ferroelectric Memory Device and Operation Method Thereof." This invention describes a ferroelectric memory device composed of multiple ferroelectric memory elements inclusive of a channel layer made from metal oxide and a ferroelectric layer containing hafnium oxide. This advanced structure is designed to enhance memory performance significantly.

Another notable patent is related to "Semiconductor Structures with Deep Trench Capacitor and Methods of Manufacture." This patent presents an integrated FinFET and deep trench capacitor structure, outlining a method to create at least one deep trench capacitor in a silicon on insulator (SOI) substrate. It details the simultaneous formation of polysilicon fins and gate structures that are crucial for modern semiconductor manufacturing.

Career Highlights

Throughout his career, Masaharu Kobayashi has contributed his expertise to renowned companies such as IBM and Sony Corporation. His work has not only advanced the field of semiconductor technologies but has also made significant impacts in the consumer electronics sector.

Collaborations

Kobayashi has collaborated with notable professionals in the industry, including Kevin K Chan and Effendi Leobandung. These collaborations have proven fruitful, leading to advancements in various innovative technologies that push the boundaries of what is possible in semiconductor design and production.

Conclusion

Masaharu Kobayashi's contributions to the field of technology are noteworthy, as evidenced by his extensive patent portfolio and his collaborations with leading figures in the industry. His innovative spirit and dedication to research continue to inspire future advancements in ferroelectric memory devices and semiconductor structures, highlighting his role as a significant figure in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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