Masaaki Tsuchihashi

Title: Masaaki Tsuchihashi: Semiconductor Processing and Electrostatic Chucking

Introduction

Masaaki Tsuchihashi is an inventor associated with Tokyo, Japan, whose patent work focuses on semiconductor manufacturing equipment. His inventions address the reliable heating, processing, and electrostatic holding of wafers. He is credited with 5 patents.

Latest Patents

Tsuchihashi’s listed patents include two inventions related to wafer processing and plasma equipment.

“Wafer Processing Apparatus” describes a system designed to secure a wafer efficiently on an electrostatic chuck. A heater preheats the wafer in the processing chamber before attraction begins. After preheating, separate variable direct-current power supplies energize two electrodes embedded in the dielectric support plate, helping hold the wafer in place.

“Plasma Processing Apparatus Capable of Reliably, Electrostatically Attracting and Holding and Thus Fixing Semiconductor Wafer” concerns reliable wafer retention during plasma processing. The apparatus calculates a voltage based on the required attraction voltage and the self-bias voltage generated under the desired plasma conditions. An electrostatic chuck power supply then applies the calculated voltage to the electrode. The patent also describes a vacuum chucking method for use with the apparatus.

Career Highlights

Tsuchihashi’s listed company affiliations include Mitsubishi Denki Kabushiki Kaisha and Mitsubishi Electric Engineering Company, Limited. His patent work reflects an emphasis on practical challenges in semiconductor fabrication, particularly maintaining stable wafer positioning during heating and plasma processing.

Collaborations

Among Tsuchihashi’s named coworkers are Minoru Hanazaki and Kouichi Ono. Their shared professional context connects his work to broader engineering efforts in semiconductor equipment and manufacturing.

Conclusion

Masaaki Tsuchihashi’s patents address key requirements of semiconductor processing by improving how wafers are heated and electrostatically secured. His work highlights the importance of dependable wafer handling in plasma-processing equipment.