Masaaki Tanabe

Title: Masaaki Tanabe: Innovator in Sputtering Technology

Introduction

Masaaki Tanabe is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 3 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of thin film production.

Latest Patents

Tanabe's latest patents include a sputtering apparatus and a sputtering method. The sputtering apparatus features a vacuum chamber designed to accommodate a target material and a substrate facing each other. It is equipped with a DC power supply that connects electrically to the target material and a pulsing unit that modulates the electric current flowing through the target. This setup generates plasma within the vacuum chamber, facilitating the formation of thin films on the substrate. Additionally, the apparatus includes an ammeter to measure the electric current and a power supply controller that performs feedback control to maintain a prescribed current value.

Another significant patent is the production apparatus and method for fine particles. This innovation aims to increase production capacity while reducing costs by efficiently introducing a large volume of material into the plasma. The apparatus comprises a material supply device with multiple supply ports for a material gas containing particles, strategically arranged below several electrodes within a vacuum chamber. It also features a first gas supply port for a shield gas and multiple second gas supply ports for an additional shield gas, enhancing the production process.

Career Highlights

Masaaki Tanabe is associated with Panasonic Intellectual Property Management Co., Ltd., where he continues to innovate in the field of sputtering technology. His work has been instrumental in advancing the capabilities of thin film production, making significant impacts in various applications.

Collaborations

Tanabe has collaborated with notable colleagues, including Hisao Nagai and Takeshi Koiwasaki. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Masaaki Tanabe's contributions to sputtering technology and fine particle production highlight his role as a leading inventor in Japan. His patents reflect a commitment to innovation and efficiency in manufacturing processes.