The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Mar. 15, 2018
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Masaaki Tanabe, Hyogo, JP;

Hisao Nagai, Osaka, JP;

Takeshi Koiwasaki, Osaka, JP;

Takafumi Okuma, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/14 (2006.01); B01J 19/08 (2006.01); C01B 33/021 (2006.01); B22F 1/00 (2006.01); C01B 32/956 (2017.01); B22F 9/16 (2006.01);
U.S. Cl.
CPC ...
B22F 9/14 (2013.01); B01J 19/088 (2013.01); B22F 1/0018 (2013.01); C01B 32/956 (2017.08); C01B 33/021 (2013.01); B01J 2219/0813 (2013.01); B01J 2219/0822 (2013.01); B01J 2219/0839 (2013.01); B01J 2219/0841 (2013.01); B01J 2219/0869 (2013.01); B01J 2219/0871 (2013.01); B01J 2219/0875 (2013.01); B01J 2219/0894 (2013.01); B22F 9/16 (2013.01); B22F 2201/013 (2013.01); B22F 2201/11 (2013.01); B22F 2201/20 (2013.01); B22F 2202/13 (2013.01); B22F 2301/10 (2013.01); B22F 2301/15 (2013.01); B22F 2301/255 (2013.01); B22F 2304/05 (2013.01); B22F 2998/10 (2013.01); B22F 2999/00 (2013.01); C01P 2004/64 (2013.01);
Abstract

A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.


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