This inventor holds 6 USPTO granted patents. Top assignees: Vacuum Metallurgical Co., Ltd., Other. Active years: 1996-2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yachimatamachi, JP (1998 - 1999)
- Yachimata, JP (1999)
- Chiba-ken, JP (1996 - 2001)
Company Filing History:
Years Active: 1996-2001
Title: The Innovative Contributions of Masaaki Oda
Introduction
Masaaki Oda, an accomplished inventor based in Chiba-ken, Japan, has made significant advancements in the field of semiconductor technology. With a total of six patents to his name, Oda has consistently contributed innovative solutions that enhance the manufacturing processes within the semiconductor industry.
Latest Patents
Among his latest inventions is a "Dispersion containing Cu ultrafine particles individually dispersed therein." This dispersion comprises an organic solvent that is resistant to evaporation at room temperature yet can evaporate during the drying-firing process. This feature is beneficial when forming Cu-distributing wires on a semiconductor substrate. The ultrafine Cu particles, with sizes no greater than 0.01 µm, are encapsulated by the organic solvent and remain separately dispersed to achieve a viscosity not exceeding 50 cP at 20 °C. This invention allows for complete filling of fine wiring grooves, via holes, and contact holes of LSI substrates, ensuring a conductive, uniform, and fine pattern on the substrate.
Another notable patent is the "Method for forming Cu-thin film." This method involves coating a semiconductor substrate, which includes recessed portions such as wiring grooves and via holes with an aspect ratio of 1 to 30, with the aforementioned dispersion. The substrate is then fired in an atmosphere that decomposes the organic substances without oxidizing the Cu, allowing for the development of a Cu-thin film in the recessed areas. This innovative approach not only facilitates the precise embedding of Cu-thin films in high aspect ratio structures but also minimizes processing costs.
Career Highlights
Masaaki Oda has worked with several prominent companies, including Vacuum Metallurgical Co., Ltd. His contributions have elevated the standards of semiconductor fabrication, marrying performance with cost-effectiveness.
Collaborations
Throughout his career, Oda has collaborated with notable professionals, including Kazuhiro Watanabe and Michihiro Oshima. Their collective expertise has been pivotal in achieving groundbreaking advancements in the semiconductor field.
Conclusion
Masaaki Oda stands out as an influential inventor whose work continues to impact the semiconductor industry. His innovative patents and collaborative efforts reflect a commitment to enhancing technology, making significant strides in the realm of semiconductor manufacturing processes. With a legacy of six patents, Oda's contributions are foundational to future advancements in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile