Kawagoe, Japan

Masaaki Nakahata


Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 140(Granted Patents)


Location History:

  • Kawagoe, JP (1979 - 1994)
  • Higashimatsuyama, JP (2008)

Company Filing History:


Years Active: 1979-2008

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6 patents (USPTO):

Title: Masaaki Nakahata: Innovator in Photoresist Technology

Introduction

Masaaki Nakahata is a prominent inventor based in Kawagoe, Japan. He has made significant contributions to the field of photoresist materials, holding a total of 6 patents. His work has been instrumental in advancing technologies used in semiconductor manufacturing.

Latest Patents

Nakahata's latest patents include innovative formulations that enhance the performance of photoresist materials. One notable patent is for Diazodisulfones, which are effective as photoacid generators when used in photoresist materials for light of 300 nm or less. Another significant patent involves a chemical amplified resist material that comprises a polymer with specific functional groups, a photoacid generator, and a solvent. This formulation provides excellent heat resistance and adhesion to substrates when exposed to deep UV light, making it suitable for forming ultrafine patterns.

Career Highlights

Throughout his career, Nakahata has worked with esteemed companies such as Wako Pure Chemical Industries, Inc. and Matsushita Electronic Industrial Co., Ltd. His experience in these organizations has allowed him to develop and refine his expertise in photoresist technology.

Collaborations

Nakahata has collaborated with notable colleagues in his field, including Fumiyoshi Urano and Hirotoshi Fujie. These partnerships have contributed to the advancement of innovative solutions in photoresist materials.

Conclusion

Masaaki Nakahata's contributions to the field of photoresist technology are noteworthy. His patents and collaborations reflect his commitment to innovation and excellence in the industry. His work continues to influence the development of advanced materials for semiconductor applications.

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