Masaaki Mitsuno

Title: Masaaki Mitsuno: Innovator in Plasma Processing Technology

Introduction

Masaaki Mitsuno is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of plasma processing technology, particularly in the manufacturing of electrode plates used in semiconductor fabrication.

Latest Patents

Masaaki Mitsuno holds a patent for a "Method for manufacturing electrode plate for plasma processing device." This innovative method involves several steps, including a curing step that heat-cures a liquid thermosetting resin to prepare a resin forming material. The process also includes one or two backing steps of carbonizing the heat-cured resin forming material by heating it under a non-oxidizing atmosphere. This results in a baking material composed of glass-like carbon. Finally, a polishing step is performed to polish one face of the baking material, which is exposed to plasma, to a depth of 20 µm to 1.25 mm. This patent showcases his expertise in enhancing the efficiency and effectiveness of plasma processing devices.

Career Highlights

Throughout his career, Masaaki Mitsuno has worked with prominent companies in the semiconductor industry. He has been associated with Tokyo Electron Limited and Tokai Carbon Company, Ltd., where he has contributed to advancements in technology and innovation.

Collaborations

Masaaki Mitsuno has collaborated with Shosuke Endoh, a fellow innovator in the field. Their partnership has likely fostered the development of new ideas and technologies in plasma processing.

Conclusion

Masaaki Mitsuno's contributions to the field of plasma processing technology, particularly through his patented methods, highlight his role as an influential inventor. His work continues to impact the semiconductor industry positively.