Tsukui-gun, Japan

Masaaki Hasei


Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 122(Granted Patents)


Location History:

  • Sagamihara, JP (1995 - 1996)
  • Tsukui-gun, JP (2000 - 2002)

Company Filing History:


Years Active: 1995-2002

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6 patents (USPTO):Explore Patents

Title: **Masaaki Hasei: Innovator in Semiconductor Technology**

Introduction

Masaaki Hasei, a prominent inventor located in Tsukui-gun, Japan, has made significant contributions to the field of semiconductor technology, securing a total of six patents throughout his career. His innovative work primarily focuses on enhancing semiconductor processes, demonstrating a deep understanding of the technology involved.

Latest Patents

Among Hasei's latest inventions is the **Single-substrate-heat-treating apparatus for semiconductor process system**. This cutting-edge apparatus is designed to execute both reforming and crystallizing processes for tantalum oxide that is deposited on semiconductor wafers. A notable feature of the device is its worktable, which has an integrated heater. Below this worktable lies a heat-compensating member composed of a thin plate, which boasts a mirror-like counter surface. This surface, characterized by a roughness of Rmax ≤ 25 µm, effectively reflects heat rays and radiant heat back toward the worktable’s periphery, addressing heat loss and optimizing the heat treatment process.

Career Highlights

Masaaki Hasei has been associated with reputable companies, including Tokyo Electron Limited and Tokyo Electron Kabushiki Kaisha. His time at these organizations has allowed him to apply his innovative ideas effectively, resulting in significant advancements in semiconductor manufacturing technologies.

Collaborations

Throughout his career, Hasei has collaborated with talented colleagues such as Wataru Okase and Wataru Ohkase. Their teamwork has contributed to the development of practical solutions aimed at improving semiconductor processing techniques.

Conclusion

In conclusion, Masaaki Hasei stands out as a notable inventor in the semiconductor industry. His patents, particularly the innovative **Single-substrate-heat-treating apparatus**, reveal his commitment to advancing technology and improving processes. With a solid background in reputable companies and collaborations with distinguished colleagues, Hasei's work continues to impact the semiconductor landscape positively.

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