Tokyo, Japan

Masaaki Eriguchi

This inventor holds 1 USPTO granted patent. Top assignee: Ebara Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaaki Eriguchi. Retrieved from https://idiyas.com/inventor/masaaki-eriguchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Masaaki Eriguchi: Innovator in Polishing Technology

Introduction

Masaaki Eriguchi is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of polishing technology, particularly through his innovative patent that enhances the efficiency of polishing processes.

Latest Patents

Masaaki Eriguchi holds a patent for a polishing apparatus and polishing method. This apparatus includes a rotatable polishing table that supports a polishing pad with a polishing surface. It features a top ring head with a top ring, a top ring head cover, and a dresser head designed to dress the polishing surface. Additionally, the apparatus is equipped with spray nozzles that clean various components during operation, ensuring optimal performance.

Career Highlights

Masaaki Eriguchi has made significant strides in his career, particularly while working at Ebara Corporation. His work has focused on developing advanced polishing technologies that are crucial for various industrial applications.

Collaborations

Masaaki has collaborated with notable colleagues, including Tadakazu Sone and Masao Umemoto. These partnerships have contributed to the advancement of polishing technology and have fostered innovation within the industry.

Conclusion

Masaaki Eriguchi's contributions to polishing technology through his patent and work at Ebara Corporation highlight his role as an influential inventor. His innovations continue to impact the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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