Chigasaki, Japan

Masaaki Aoyama


Average Co-Inventor Count = 1.6

ph-index = 6

Forward Citations = 202(Granted Patents)


Location History:

  • Kawasaki, JP (1990)
  • Yokohama, JP (1993)
  • Kanagawa, JP (1994)
  • Chigasaki, JP (1996 - 2004)
  • Kanagawa-ken, JP (2004)

Company Filing History:


Years Active: 1990-2004

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6 patents (USPTO):Explore Patents

Title: **Masaaki Aoyama: Innovator in Semiconductor Processing Technology**

Introduction

Masaaki Aoyama, hailing from Chigasaki, Japan, is a prominent inventor known for his pivotal contributions to the field of semiconductor processing. With a remarkable portfolio of six patents, Aoyama has significantly advanced the technologies related to exposure apparatus and substrate processing, particularly within the sphere of micro device production.

Latest Patents

Among his latest patents, Aoyama's work includes innovations such as an exposure apparatus designed with independent chambers. This apparatus, remarkably structured, ensures that the environments within each chamber—housing the main exposure system, substrate carrying system, and mask carrying system—are maintained independently. This strategic design enhances substrate processing by integrating photoelectric detection to ensure precise handling. Another notable patent involves a compact substrate processing apparatus aimed specifically at coating photoresist on substrates while forming predetermined patterns through exposure. This design minimizes the number of transfer shafts and streamlines wafer exchange processes, thereby improving production throughput.

Career Highlights

Aoyama has dedicated his expertise to Nikon Corporation, a leader in optical and imaging technology. His work at Nikon has not only placed him at the forefront of technological innovation but has also contributed to the advancement of semiconductor fabrication processes. His patents reflect a deep understanding of the complexities involved in substrate processing, underscoring his status as a key figure in the industry.

Collaborations

Collaboration is essential in innovation, and Aoyama has worked alongside notable peers, including Keiichi Kimura and Naomasa Shiraishi. Their collective efforts contribute to a collaborative environment that fosters advanced technological breakthroughs within Nikon Corporation and beyond.

Conclusion

Masaaki Aoyama stands as a testament to innovation in the semiconductor industry. His patents demonstrate not only technical prowess but also a commitment to enhancing the efficiency of semiconductor processing technology. As advancements in this field continue, Aoyama's contributions are sure to leave a lasting impact on the development of micro devices, reaffirming his legacy as a significant inventor in modern technology.

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