The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 1996
Filed:
Aug. 01, 1994
Applicant:
Inventors:
Kenji Nishi, Yokohama, JP;
Masaaki Aoyama, Chigasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 30 ; 355 53 ;
Abstract
An exposure apparatus includes a cleaning tool which is located at a position where it is brought into contact with the entire surface of a wafer holder when a wafer stage moves within a predetermined driving range, and a vertical driving shaft for biasing the cleaning tool against the wafer holder. While the cleaning tool is biased against the wafer holder, the wafer stage is moved within the predetermined driving range, thereby cleaning the wafer holder.
Quick Actions:
Nishi, Kenji. (1996). Exposure apparatus (U.S. Patent No. 5559582). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5559582
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile