Mary Jane Brodsky

Title: Mary Jane Brodsky: Innovator in Optical Inspection Methods

Introduction

Mary Jane Brodsky is a notable inventor based in Salt Point, NY (US). She has made significant contributions to the field of optical inspection methods, particularly in semiconductor manufacturing. With a total of 2 patents, her work has advanced the techniques used in the industry.

Latest Patents

Brodsky's latest patents focus on innovative optical inspection methods. One method involves adhering an optical blocking layer directly onto a semiconductor process wafer, which is substantially opaque to a range of wavelengths of light. This method includes applying at least one layer over the blocking layer and inspecting optically at least one wavelength in the inspection area. Another inspection method includes adhering an optical absorbing layer to a semiconductor process wafer, designed to absorb a range of wavelengths of light. Additionally, her manufacturing method ascertains if a defect is present within a photoresist layer and changes the semiconductor manufacturing process to prevent the defect if it is detected.

Career Highlights

Mary Jane Brodsky is currently associated with International Business Machines Corporation (IBM). Her work at IBM has allowed her to explore and develop cutting-edge technologies in optical inspection, contributing to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Brodsky has collaborated with notable coworkers, including Colin J Brodsky and Sean David Burns. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Mary Jane Brodsky's contributions to optical inspection methods have made a significant impact on semiconductor manufacturing. Her innovative approaches and collaborations continue to drive advancements in technology.