This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Infineon Technologies Ag. Active years: 2004-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- München, DE (2004 - 2006)
- Munich, DE (2007 - 2008)
Company Filing History:
Years Active: 2004-2008
Title: Martin Verbeek: Innovator in Lithography Mask Inspection
Introduction
Martin Verbeek is a notable inventor based in Munich, Germany. He has made significant contributions to the field of lithography, particularly in the inspection of periodic structures on lithography masks. With a total of four patents to his name, Verbeek's work has advanced the methodologies used in this critical area of technology.
Latest Patents
One of Verbeek's latest patents is a method for checking periodic structures on lithography masks. This invention involves generating an image of the structure of the lithography mask using an imaging optic of a microscope. The method provides a way to inspect structures on lithography masks, allowing for better demarcation of periodic structures from deviations. The parameters of wavelength, numerical aperture, and coherence of the illumination are carefully chosen to fulfill the resolution limit for periodic structures. Another significant patent is a method for the inspection of periodic grating structures on lithography masks. This method utilizes a microscope with adjustable illumination and a mechanical stage to record images of the lithography mask at specific locations. The position, size, and pitch specifications of the lithography mask are stored for accurate inspection.
Career Highlights
Martin Verbeek is currently employed at Infineon Technologies AG, where he continues to innovate in the field of lithography. His work has been instrumental in enhancing the accuracy and efficiency of lithography mask inspections.
Collaborations
Throughout his career, Verbeek has collaborated with notable colleagues such as Roderick Koehle and Torsten Franke. These collaborations have contributed to the development of advanced techniques in lithography.
Conclusion
Martin Verbeek's contributions to the field of lithography mask inspection are significant and impactful. His innovative methods and patents continue to shape the industry, demonstrating his expertise and commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile