The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Sep. 24, 2003
Applicants:
Ralf Ludwig, München, DE;
Martin Verbeek, München, DE;
Inventors:
Ralf Ludwig, München, DE;
Martin Verbeek, München, DE;
Assignee:
Infineon Technologies AG, , DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a defect repair method, in particular for repairing quartz defects on alternating phase shift masks, wherein, for repairing defects () existing on one and the same component (), both, defect repair method steps substantially based on mechanical processes (S), in particular nanomachining method steps, and defect repair method steps substantially based on etching processes (S), in particular FIB (Focused Ion Beam) method steps, are used. Moreover, the invention relates to a component (), in particular a photomask, repaired by making use of such a defect repair method.