Martin Schmidt

Title: Innovations by Inventor Martin Schmidt in Extreme Ultraviolet Radiation

Introduction

Martin Schmidt, a notable inventor based in Vanves, France, has made significant contributions to the field of extreme ultraviolet (EUV) and soft X-ray radiation. With a total of three patents to his name, Schmidt's innovative approaches have paved the way for advancements in lithography technology crucial for integrated circuit fabrication.

Latest Patents

Among his latest patents, Martin Schmidt has developed a **Method and Device for Producing Extreme Ultraviolet Radiation or Soft X-ray Radiation**. This device incorporates a laser source that generates laser radiation, which is then focused to extreme intensities beyond 10 W/cm² onto a target to produce a plasma. The design includes electrodes surrounding the plasma's path, which collaborate with components to produce a rapid electric discharge in the plasma, optimizing the characteristic time constant of the discharge.

Another significant patent is the **Apparatus for Generating Light in the Extreme Ultraviolet and Use in a Light Source for Extreme Ultraviolet Lithography**. This device is engineered to create a linear target in an evacuated space, where focused laser beams interact to emit plasma that radiates in the extreme ultraviolet spectrum. The invention includes a receiver device that captures the target post-interaction and a collector device that gathers the emitted EUV radiation, ensuring precise alignment and collection that is vital for lithography.

Career Highlights

Martin Schmidt's career has seen him involved with prominent organizations, including the French Atomic Energy Commission (Commissariat à l'Énergie Atomique) and Xtreme Technologies GmbH. His work in these institutions has enabled him to gain insights and exposure to cutting-edge technologies in the field of radiation generation.

Collaborations

Throughout his career, Martin Schmidt has collaborated with notable colleagues, including Olivier Sublemontier and Rainer-Helmut Lebert. These collaborations have likely contributed to the development of his innovative patents and advancements in relevant technologies.

Conclusion

With a keen focus on extreme ultraviolet radiation, Martin Schmidt stands out as a pivotal figure in the advancement of lithography technologies. His inventions not only demonstrate his expertise but also contribute significantly to the evolving landscape of integrated circuit fabrication, showcasing the importance of innovation in modern technology.