Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography

Abstract

The device comprises a device () for creating an essentially linear target () in an evacuated space where laser beams () are focused, the target being suitable for interacting with the focused laser beams () to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device () receives the target () after it has interacted with the focused laser beams (), and a collector device () collects the EUV radiation emitted by the target (). The focusing elements () for focusing the laser beams on the target () are arranged in such a manner that the laser beams () are focused on the target () laterally, being situated in a common half-space relative to the target () and being inclined at a determined angle lying in the range about 60° to about 90° relative to a mean collection axis () perpendicular to the target (). The collector device () is disposed symmetrically about the mean collection axis () in the half-space containing the laser beams () focused on the target () and inside a conical space () centered on the mean collection axis () with a vertex situated at the target () and a half-angle at the vertex that is less than the angle of inclination of the focused laser beams () relative to the mean collection axis (). The device is suitable for use as a source for EUV radiation in lithography for fabricating integrated circuits.