The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Apr. 12, 2002
Applicant:
Inventors:
Martin Schmidt, Vanves, FR;
Olivier Sublemontier, Fontenay-Aux-Roses, FR;
Assignee:
Commissariat a l'Energie Atomique, Paris, FR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/00 ; H01J 3/500 ;
U.S. Cl.
CPC ...
G21K 5/00 ; H01J 3/500 ;
Abstract
Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog.
Schmidt, Martin. (2003). Production of a dense mist of micrometric droplets in particular for extreme uv lithography (U.S. Patent No. 6647088). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6647088
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile