Martin Kranz

Title: Martin Kranz - Innovator in Substrate Cleaning Technology

Introduction

Martin Kranz is a notable inventor based in Ottendorf-Okrilla, Germany. He has made significant contributions to the field of substrate cleaning technology. His innovative approach has led to the development of a unique method and apparatus for cleaning substrates, which is essential in various manufacturing processes.

Latest Patents

Martin Kranz holds 1 patent for his invention titled "Method and apparatus for cleaning substrates." This patent describes a method for pre-cleaning native oxides and other contaminants from apertures on a substrate. In one embodiment, the method involves disposing the substrate on a support member in a process chamber, cooling the substrate to a temperature of at least 100 degrees Celsius, and exposing it to a pre-clean process. Another embodiment includes cooling the substrate in a first chamber before transferring it to a second chamber for pre-cleaning while maintaining the substrate temperature.

Career Highlights

Martin Kranz is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on enhancing the efficiency and effectiveness of substrate cleaning processes, which are critical in semiconductor manufacturing and other high-tech industries.

Collaborations

Throughout his career, Martin has collaborated with talented professionals, including Srinivas Guggilla and Suraj Rengarajan. These collaborations have contributed to the advancement of technology in substrate cleaning and have fostered innovation within the industry.

Conclusion

Martin Kranz is a distinguished inventor whose work in substrate cleaning technology has made a significant impact on the industry. His innovative methods continue to pave the way for advancements in manufacturing processes.