The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Dec. 12, 2001
Martin Kranz, Ottendorf-Okrilla, DE;
Srinivas Guggilla, Sunnyvale, CA (US);
Suraj Rengarajan, San Jose, CA (US);
Mei Chang, Saratoga, CA (US);
Gongda Yao, Fremont, CA (US);
Nitin Khurana, Milpitas, CA (US);
Gilbert Hausmann, Felton, CA (US);
Martin Kranz, Ottendorf-Okrilla, DE;
Srinivas Guggilla, Sunnyvale, CA (US);
Suraj Rengarajan, San Jose, CA (US);
Mei Chang, Saratoga, CA (US);
Gongda Yao, Fremont, CA (US);
Nitin Khurana, Milpitas, CA (US);
Gilbert Hausmann, Felton, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Generally, a method for pre-cleaning native oxides and other contaminants from apertures on a substrate is provided. In one embodiment, a method for pre-cleaning apertures on a substrate includes disposing the substrate on a support member in a process chamber, cooling the substrate at least to a temperature of 100 degrees Celsius, and exposing the substrate to a pre-clean process. In another embodiment, a method for pre-cleaning apertures on a substrate includes cooling the substrate at least to a temperature of 100 degrees Celsius in a first chamber, transferring the substrate to a second chamber and pre-cleaning the substrate in the second chamber while maintaining a substrate temperature of 100 degrees Celsius.