Applied Materials, Inc.

Martin Kranz

Mei Yin Chang

Gongda Yao

Gilbert Hausmann

Nitin Khurana

Suraj Rengarajan

Srinivas Guggilla

Generally, a method for pre-cleaning native oxides and other contaminants from apertures on a substrate is provided. In one embodiment, a method for pre-cleaning apertures on a substrate includes disposing the substrate on a support member in a process chamber, cooling the substrate at least to a temperature of 100 degrees Celsius, and exposing the substrate to a pre-clean process. In another embodiment, a method for pre-cleaning apertures on a substrate includes cooling the substrate at least to a temperature of 100 degrees Celsius in a first chamber, transferring the substrate to a second chamber and pre-cleaning the substrate in the second chamber while maintaining a substrate temperature of 100 degrees Celsius.

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Ottendorf-Okrilla, Germany

Martin Kranz