Company Filing History:
Years Active: 1993
Title: Martin J Harris: Innovator in Electrophoretic Deposition Technologies
Introduction
Martin J Harris is a notable inventor based in Leominster, MA (US). He has made significant contributions to the field of conductive substrate processing, holding a total of 2 patents. His work focuses on innovative methods that enhance the precision and efficiency of etching and plating processes.
Latest Patents
Harris's latest patents include "Selective and precise etching and plating of conductive substrates" and "Apparatus and process for electrophoretic deposition." The first patent describes a method for selective and precise etching and plating of a conductive substrate through electrophoretic deposition of a photoresist composition. This invention enables chemical milling and plating of products useful in high-performance applications, such as lead frames with lead widths less than 1.0 mil and precisely plated lead faces. The second patent outlines a method and apparatus for electrodeposition of insulating coatings, such as photoresists, that have uniform thickness throughout the coating. The apparatus comprises one or more cathodes and anodes disposed in a bath containing an electrophoretic depositing composition, with means for applying a voltage to produce a current density gradient on the cathode.
Career Highlights
Martin J Harris is currently associated with Shipley Company, L.L.C., where he continues to develop innovative solutions in the field of electrophoretic deposition. His expertise in this area has positioned him as a key player in advancing technologies that require high precision and reliability.
Collaborations
Harris has collaborated with notable coworkers, including Ivan K Ho and Stephen S Rodriguez, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Martin J Harris stands out as an influential inventor in the realm of conductive substrate processing. His patents reflect a commitment to advancing technology through innovative methods and apparatuses. His contributions continue to impact high-performance applications significantly.
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