Eindhoven, Netherlands

Martijn Cornelis Schaafsma

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Asml Netherlands B.v.. Active years: 2021-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martijn Cornelis Schaafsma. Retrieved from https://idiyas.com/inventor/martijn-cornelis-schaafsma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Martijn Cornelis Schaafsma

Introduction:

Martijn Cornelis Schaafsma is a prolific inventor hailing from Eindhoven, Netherlands, with a notable portfolio of two patents in the field of lithographic processes. His groundbreaking work has significantly impacted the realm of optical technology, particularly in reducing the effects of lens heating and predicting aberrations in projection systems.

Latest Patents:

1. Method of reducing effects of lens heating and/or cooling in a lithographic process: Martijn's patent introduces a novel approach within a lithographic apparatus to mitigate the impact of heating and cooling on optical components during the lithographic process. The control system he developed effectively minimizes aberrations by selecting mode shapes and applying corrections based on them.

2. Measurement apparatus and method for predicting aberrations in a projection system: This patent focuses on calibrating a projection system's heating model to predict aberrations accurately. By employing a method that involves making timely measurements of aberrations caused by exposure radiation, Martijn has paved the way for enhanced accuracy in lithographic processes.

Career Highlights:

Martijn Schaafsma is an esteemed member of the ASML Netherlands B.V., a prominent company known for its cutting-edge innovations in the semiconductor industry. His expertise and contributions have significantly bolstered the company's reputation as a leader in lithography technology.

Collaborations:

During his tenure at ASML Netherlands B.V., Martijn has had the opportunity to collaborate with talented individuals such as Mhamed Akhssay and James Robert Downes. Together, they have synergized their skills and knowledge to push the boundaries of optical technology further.

Conclusion:

In conclusion, Martijn Cornelis Schaafsma stands as a testament to ingenuity and dedication in the realm of innovation. His patents underscore his commitment to advancing lithographic processes and optimizing the performance of optical systems. With a keen eye for detail and a passion for problem-solving, Martijn continues to be a driving force in the evolution of optical technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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