This inventor holds 6 USPTO granted patents. Top assignee: Hoechst Aktiengesellschaft. Active years: 1982-1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1982-1989
Title: Innovations of Markus Seibel
Introduction
Markus Seibel is a notable inventor based in Mainz, Germany. He has made significant contributions to the field of radiation-sensitive materials and electrical insulation. With a total of 6 patents to his name, Seibel's work has advanced various technologies in his industry.
Latest Patents
One of his latest patents involves a radiation-sensitive recording material that comprises a support, a radiation-sensitive recording layer, and a rough covering layer. This innovative material is applied by spraying and drying a solution that has a composition similar to the recording layer. The rough surface of the material enhances vacuum contact during the copying process. Another significant patent focuses on a method and manufacture for electrically insulating base material used in perforated plated-through printed circuit panels with a metal core. This method includes applying a radiation-curable layer of insulating material to a pre-perforated metal core using an electrostatic spray method, followed by a series of curing processes to ensure uniform thickness and impervious coatings.
Career Highlights
Markus Seibel is associated with Hoechst Aktiengesellschaft, where he has been instrumental in developing innovative materials. His expertise in radiation-sensitive technologies has positioned him as a key figure in his field.
Collaborations
Seibel has collaborated with notable coworkers such as Werner Franke and Guenther Kaempf. Their combined efforts have contributed to the advancement of technologies in their respective areas of expertise.
Conclusion
Markus Seibel's contributions to the field of inventions, particularly in radiation-sensitive materials and electrical insulation, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
