Lucerne, Switzerland

Markus Helfenstein

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 2001-2025

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12 patents (USPTO):Explore Patents

Title: Innovations of Markus Helfenstein

Introduction

Markus Helfenstein is a notable inventor based in Lucerne, Switzerland. He has made significant contributions to the field of flow measurement technology, holding a total of 12 patents. His work reflects a commitment to optimizing measurement processes and enhancing the efficiency of flowmeters.

Latest Patents

Among his latest patents is a flowmeter featuring an optimized flow cross-section. This innovative design aims to improve the accuracy and reliability of fluid measurement. Another notable patent involves a flow meter that includes a measuring channel formed by a hydroforming process. This flow meter incorporates at least two spaced-apart measuring sensors, preferably ultrasonic sensors. The coupling in and out of the measurement signals occurs via a coupling part inserted into the circumferential wall of the measuring channel produced through hydroforming. Alternatively, the coupling can also occur through the wall of the measuring channel.

Career Highlights

Throughout his career, Markus Helfenstein has worked with several prominent companies, including GWF Messsysteme AG and ST-Ericsson SA. His experience in these organizations has allowed him to develop and refine his innovative ideas in flow measurement technology.

Collaborations

Markus has collaborated with talented individuals such as Hans-Andrea Loeliger and Felix Lustenberger. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Markus Helfenstein's contributions to flow measurement technology through his patents and collaborations highlight his innovative spirit and dedication to improving measurement processes. His work continues to influence the industry and inspire future advancements.

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