Breda, Netherlands

Markus F Eurlings

This inventor holds 2 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2003-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus F Eurlings. Retrieved from https://idiyas.com/inventor/markus-f-eurlings

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2003-2004

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Markus F Eurlings - Revolutionizing Lithography Technology

Introduction:

Markus F Eurlings, a talented inventor based in Breda, Netherlands, is making waves in the field of lithography with his groundbreaking patents. With a keen eye for innovation and precision, Eurlings has successfully secured two patents to date, showcasing his expertise in developing advanced illuminator technology for lithography apparatus.

Latest Patents:

Eurlings' latest patents focus on an illuminator designed for controlling a beam of radiation in lithographic projection apparatus. This innovative technology includes a series of optical elements and an exchanger that can insert and remove these elements from the beam path. The intensity distribution of the beam at a pupil plane is determined by these optical elements, allowing for various illumination settings without the need for a zoom-axicon module.

Career Highlights:

Markus F Eurlings is a valuable asset to Asml Netherlands B.V., where he channels his creative energy into developing cutting-edge solutions for lithography processes. His contributions have not only enhanced the efficiency of lithography apparatus but also paved the way for new possibilities in the field of semiconductor manufacturing.

Collaborations:

Throughout his career, Eurlings has collaborated closely with esteemed professionals like Jan Jaap Krikke, leveraging their combined expertise to push the boundaries of lithography technology. This collaborative spirit has been instrumental in the success of Eurlings' patented innovations, highlighting the power of teamwork in driving technological advancements.

Conclusion:

Markus F Eurlings stands out as a visionary inventor who continues to shape the landscape of lithography technology with his unparalleled creativity and dedication. His patents represent a significant milestone in the industry, setting a new standard for precision and efficiency in semiconductor manufacturing. Eurlings' relentless pursuit of innovation serves as an inspiration to aspiring inventors and underscores the transformative impact of breakthrough inventions in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…