This inventor holds 19 USPTO granted patents and 11 published patent applications, plus 1 CIPO patent and 5 EPO patents, primarily in Thin-Film Deposition. Top assignee: Picosun Oy. Active years: 2020-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Espoo, FI (2020 - 2024)
- Masala, FI (2022 - 2024)
Company Filing History:
Years Active: 2020-2026
Areas of Expertise:
Title: Innovator Marko Pudas: Pioneering Substrate Processing Technologies
Introduction
Marko Pudas, an accomplished inventor based in Espoo, Finland, has made significant contributions to the field of substrate processing. With a total of 17 patents to his name, he is renowned for developing innovative technologies that enhance the efficiency and effectiveness of chemical reactions in various applications.
Latest Patents
Two of his latest patents demonstrate his inventive prowess. The first is a "Porous Inlet," which describes a substrate processing apparatus with a unique design featuring a reaction chamber and an inlet opening. This apparatus incorporates an in-feed line that introduces reactive chemicals while controlling the gas flow, employing a gas-permeable wall that allows for efficient fluid interaction.
The second patent, titled "Substrate Processing Methods and Apparatus," outlines a method and apparatus that utilize a vertical flow reaction chamber. This design includes a flow guiding component and a substrate support located centrally within the reaction chamber, optimizing the vertical flow by redirecting it strategically to enhance substrate processing efficiency.
Career Highlights
Marko Pudas is currently employed at Picosun Oy, a leading company in providing atomic layer deposition (ALD) technologies. His work has positioned the company at the forefront of innovation in substrate processing technologies, helping to advance not only industrial applications but also research initiatives.
Collaborations
Throughout his career, Marko has collaborated with talented individuals, including fellow innovators Niku Oksala and Juhana Kostamo. These collaborations have fostered an environment of creativity and innovation, driving the development of novel technologies and enhancing the capabilities of their projects.
Conclusion
With a solid foundation of patents and a commitment to advancing substrate processing technology, Marko Pudas continues to be a significant figure in his field. His innovative contributions and collaborative efforts at Picosun Oy exemplify the spirit of invention, paving the way for further advancements in technology and practical applications. As the industry evolves, Pudas's work will undoubtedly continue to influence the future of substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile