Picosun Oy

Marko Pudas

Niku Oksala

Juhana Kostamo

Timo Malinen

Väinö Kilpi

Jani Kivioja

Tom Blomberg

Riina Ritasalo

Timo Vähä-Ojala

Timo Vaha-Ojala

An apparatus, a method and a valve with a reactive chemical inlet, a reaction chamber outlet, and a closure having an open and closed configuration to open and close, respectively, a route from the reactive chemical inlet to the reaction chamber outlet, the valve further including an additional cleaning chemical inlet at a downstream side of the closure to purge the closure.

ALD apparatus, method and valve

A substrate processing apparatus including a reaction chamber with an inlet opening, an in-feed line to provide a reactive chemical into the reaction chamber via the inlet opening, incoming gas flow control means in the in-feed line, the in-feed line extending from the flow control means to the reaction chamber, the in-feed line in this portion between the flow control means and the reaction chamber having the form of an inlet pipe with a gas-permeable wall, the inlet pipe with the gas-permeable wall extending towards the inlet opening through a volume at least partly surrounding the inlet pipe, and the apparatus () being configured to provide fluid to surround and enter the inlet pipe in said portion.

Porous inlet

A method and a substrate processing apparatus including a vertical flow reaction chamber, a flow guiding part and a substrate support at a horizontally central area of the reaction chamber, the substrate support residing underneath the flow guiding part, and the flow guiding part forcing the vertical flow from above the flow guiding part to go round the flow guiding part on its downward way towards the substrate support.

Substrate processing methods and apparatus

A fluid inlet assembly for a substrate processing apparatus includes a fluid inlet pipe configured to pass through a wall of a sealed pressure vessel, a resilient element around the fluid inlet pipe outside the sealed pressure vessel coupling the fluid inlet pipe to the wall, and first and second end parts, the resilient element being coupled therebetween.

Adjustable fluid inlet assembly for a substrate processing apparatus and method

Chemical deposition reactor assembly configured for formation of coatings on surfaces of fluid-permeable materials, such as porous materials, by chemical deposition is provided, the reactor assembly includes a reaction chamber configured to receive, at least in part, a fluid-permeable substrate with a target surface to be coated; at least one reactive fluid intake line configured to mediate a flow of reactive fluid into the reaction chamber, and an inert fluid delivery arrangement with at least one enclosed section configured to mediate a flow of inert fluid through the substrate towards its' target surface such, that at the surface the flow of inert fluid encounters the flow of reactive fluid, whereby a coating is formed at the target surface of the fluid-permeable substrate.

Coating of fluid-permeable materials

A structure is provided comprising a number of surfacesjoined together with an adhesive, said structure being configured to reshape upon at least partial degradation of the adhesive. Related method and uses are further provided.

Spring loaded medical device

A strain sensor that includes a first atomic layer deposition layer, a flexible molecular layer deposition layer on top of the first atomic layer deposition layer, and a second atomic layer deposition layer on top of the molecular layer deposition layer.

Sensor and its manufacturing method

A method for cleaning a medical instrument and for detecting residue thereon is provided in which method a non-sterile or conventionally sterilized medical instrument is exposed to pressure below 100 hPa, and, subsequently, exposed to at least one gas reactive to the residue.

Method and apparatus for cleaning medical instruments and for detecting residue thereon

A method for manufacturing a coated itemin a chemical deposition reactor and a coated item produced by the method are provided. The method includes deposition of a first coating on a first surface of the item, and/or deposition of a second coating on a second surface of the item.

Manufacturing of coated items

A method for coating a vaporizing substrate includes depositing a film coatingon at least a part of a substrateduring the time when the substrate undergoes phase transition from essentially liquid phase to gaseous phase, where the substrate includes a chemical substance that participates in chemical deposition reaction(s) in gaseous phase, the gaseous speciesformed upon vaporizing at least the portion of the substrate material, when undergoing chemical deposition reactions in gaseous phase, produce particulatethat forms at least one coating layer to produce the film coating

Substrate coating

A substrate processing apparatus, includes a sealed pressure vessel, such as an Atomic Layer Deposition, ALD, apparatus, a fluid inlet assembly attached to a wall of the sealed pressure vessel, the fluid inlet assembly having a fluid inlet pipe passing through the wall, and a resilient element in the fluid inlet assembly around the fluid inlet pipe coupling the inlet pipe to the wall, where one of an interior surface and an exterior surface of the resilient element sees pressure prevailing within the pressure vessel and the other sees ambient pressure, and where the fluid inlet pipe prevents fluid carried inside from being in contact with the resilient element, and a relating method.

A method for formation of a patterned solder mask () on a substrate is provided, in which method the mask is deposited by a process of chemical deposition in vapor phase. A method for manufacturing a printed circuit board and/or an electronic component comprising formation of said patterned solder mask is further provided.

Method for formation of patterned solder mask

A substrate processing apparatus, including a reaction chamber, at least one coating material inlet to the reaction chamber, a movable substrate support to support 3D substrates to be coated, and an actuator configured to move the substrate support to change the orientation of said 3D substrates during substrate processing. A method for coating 3D substrates, the method including providing 3D substrates within a reaction chamber on a substrate support, feeding at least one coating material into the reaction chamber, and changing the orientation of said 3D substrates during substrate processing by actuating a movement of the substrate support.

Coating of 3-dimensional substrates

An atomic layer deposition (ALD) method in an ALD reactor including a reaction chamber housing a substrate vessel, and an isolated vibration source outside of the reaction chamber or isolated within the reaction chamber. Particulate material within the substrate vessel is coated by self-saturating surface reactions using a top-to-bottom precursor flow passing through the substrate vessel, and movements are caused in the particulate material within the substrate vessel by the isolated vibration source while coating the particulate material.

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Espoo, Finland

Marko Pudas