Company Filing History:
Years Active: 2016-2019
Title: Mark Sowa: Innovator in Plasma Enhanced Atomic Layer Deposition
Introduction
Mark Sowa is a notable inventor based in Medford, MA (US). He has made significant contributions to the field of atomic layer deposition, particularly through his innovative patents. With a total of 2 patents, Sowa continues to push the boundaries of technology in his area of expertise.
Latest Patents
Sowa's latest patents include an improved Plasma Enhanced Atomic Layer Deposition (PEALD) system. This system features a vacuum reaction chamber that effectively separates unreacted precursors from reaction byproducts. The design incorporates a trap that removes the first precursor from the outflow, ensuring a more efficient deposition process. Additionally, he has developed a method for performing a radical-enhanced atomic-layer deposition process. This method utilizes a gas mixture to generate oxygen radicals, which are essential for forming oxide films on substrate surfaces.
Career Highlights
Mark Sowa is currently employed at Ultratech, Inc., where he applies his expertise in atomic layer deposition technologies. His work has been instrumental in advancing the capabilities of deposition systems, making them more efficient and effective for various applications.
Collaborations
Sowa collaborates with talented individuals such as Robert Kane and Michael J Sershen. These partnerships enhance the innovative environment at Ultratech, Inc. and contribute to the development of cutting-edge technologies.
Conclusion
Mark Sowa's contributions to the field of atomic layer deposition through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in technology and materials science.