This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Cymer, Inc.. Active years: 2003-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003-2005
Title: Innovations of Mark R Lewis in Laser Technology
Introduction
Mark R Lewis is a notable inventor based in Oceanside, CA (US). He has made significant contributions to the field of laser technology, holding a total of 2 patents. His work focuses on improving the efficiency and safety of laser discharge chambers through innovative cleaning and passivation methods.
Latest Patents
One of his latest patents involves the use of plasma for cleaning and passivating laser discharge chambers. In this invention, an oxygen-based plasma is generated in a plasma source external to the chamber by applying a radiofrequency signal to oxygen-containing gases. This plasma is then drawn into the laser discharge chamber, where it reacts with contaminants to clean the internal surfaces. Following this cleaning process, a fluorine-based plasma is introduced to passivate the internal surfaces. This method is designed to be safer, more efficient, and more effective than traditional thermal cleaning and passivation processes.
Career Highlights
Mark R Lewis is currently employed at Cymer, Inc., where he continues to develop innovative solutions in laser technology. His work has been instrumental in advancing the capabilities of laser systems, particularly in the semiconductor manufacturing industry.
Collaborations
Throughout his career, Mark has collaborated with several talented individuals, including Tom A Watson and Richard L Sandstrom. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Mark R Lewis is a pioneering inventor whose work in laser technology has led to significant advancements in the field. His innovative approaches to cleaning and passivating laser discharge chambers demonstrate his commitment to improving efficiency and safety in laser applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
