Schaumburg, IL, United States of America

Mark L Dell'Eva

This inventor holds 1 USPTO granted patent. Top assignee: Gm Global Technolgoy Operations, Inc.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark L Dell'Eva. Retrieved from https://idiyas.com/inventor/mark-l-dell-eva-7o5nuoza

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Mark L Dell'Eva: Innovator in Laser Profiling Technology

Introduction

Mark L Dell'Eva is a notable inventor based in Schaumburg, IL (US). He has made significant contributions to the field of laser profiling technology. His innovative work focuses on enhancing precision in surface dimensional grouping apparatuses.

Latest Patents

Mark L Dell'Eva holds a patent for a "Laser profiler for high precision surface dimensional grouping apparatus." This invention involves a laser optical profiler designed to determine the shape of a workpiece. The profiler includes various components such as a laser probe line, imaging lens means, and a beam splitter. These elements work together to provide accurate measurements and determine the profile of the workpiece.

Career Highlights

Mark is currently employed at Gm Global Technology Operations LLC, where he continues to develop and refine his inventions. His work has been instrumental in advancing laser profiling technology, making it more efficient and reliable.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as Chieh-Yi Jerry Yen and Jacob N George. These partnerships have contributed to the success of his projects and innovations.

Conclusion

Mark L Dell'Eva is a distinguished inventor whose work in laser profiling technology has made a significant impact in the field. His dedication to innovation continues to drive advancements in precision measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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