This inventor holds 2 USPTO granted patents. Top assignee: Goodrich Corporation. Active years: 2020.
Company Filing History:
Years Active: 2020
Title: Mark K Lentz: Innovator in Composite Structures
Introduction
Mark K Lentz is a notable inventor based in Spokane Valley, WA (US). He has made significant contributions to the field of composite structures, holding a total of 2 patents. His work focuses on enhancing processes that involve the treatment of substrates, particularly in the context of chemical vapor infiltration (CVI) and chemical vapor deposition (CVD).
Latest Patents
Lentz's latest patents include a "System having a cooling element for densifying a substrate" and a "Containment structure for creating composite structures." The first patent describes a process chamber designed for making composite structures using CVI/CVD. This chamber features multiple compartments, each equipped with its own substrate support structure, gas inlet, gas outlet, cooling element, heating element, and a control system. This allows for independent control of the process conditions for treating substrates. The second patent outlines a containment structure that holds a substrate during CVI/CVD treatment. This structure includes a support structure, a cover portion, and gas inlets and outlets. During the CVI/CVD process, reactant gas is introduced into the containment structure, facilitating the formation of a binding matrix within the substrate.
Career Highlights
Mark K Lentz is associated with Goodrich Corporation, where he has applied his innovative ideas to advance the field of composite materials. His work has been instrumental in developing technologies that improve the efficiency and effectiveness of substrate treatment processes.
Collaborations
Lentz has collaborated with notable colleagues such as Mark Russell Wolke and John Edgar Finley. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Mark K Lentz is a distinguished inventor whose work in composite structures has led to significant advancements in substrate treatment processes. His contributions continue to influence the field and pave the way for future innovations.
