The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Apr. 21, 2009
Applicants:
John E Finley, Liberty Lake, WA (US);
Robert A. Fiala, Spokane, WA (US);
Mark R. Wolke, Spokane, WA (US);
Mark K. Lentz, Spokane Valley, WA (US);
Inventors:
John E Finley, Liberty Lake, WA (US);
Robert A. Fiala, Spokane, WA (US);
Mark R. Wolke, Spokane, WA (US);
Mark K. Lentz, Spokane Valley, WA (US);
Assignee:
Goodrich Corporation, Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/44 (2006.01); B05C 9/14 (2006.01);
U.S. Cl.
CPC ...
C23C 16/045 (2013.01); B05C 9/14 (2013.01); C23C 16/4412 (2013.01);
Abstract
A process chamber for making composite structures using CVI/CVD is provided. The process chamber has a plurality of compartments. Each compartment has its own equipment such as, for example, a substrate support structure, a gas inlet, a gas outlet, a cooling element and a heating element, and control system for independently controlling the process conditions for treating a substrate contained within.