Somerville, MA, United States of America

Mark J Dalberth

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: Mark J Dalberth: Innovator in Atomic Layer Deposition Technology

Introduction

Mark J Dalberth is a notable inventor based in Somerville, MA (US). He has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of 2 patents to his name, Dalberth's work focuses on innovative methods for coating surfaces on substrates.

Latest Patents

Dalberth's latest patents include an advanced atomic layer deposition head. This ALD coating method provides a coating surface on a substrate by utilizing a deposition head that includes a unit cell with a first and second precursor nozzle assembly. The method involves emitting a first precursor and a second precursor into a chamber under atmospheric conditions, both directed substantially normal to the coating surface. The substrate is then moved under the deposition head, allowing the first precursor to be directed onto a specific area of the coating surface before the second precursor is applied.

Another significant patent by Dalberth is a method for high-velocity and atmospheric-pressure atomic layer deposition. This method also utilizes a deposition head with a unit cell and involves similar steps of precursor emission and substrate movement. These innovations aim to enhance the efficiency and effectiveness of the ALD process.

Career Highlights

Mark J Dalberth is currently employed at Ultratech, Inc., where he continues to develop cutting-edge technologies in the field of atomic layer deposition. His work has positioned him as a key figure in advancing ALD methods, contributing to various applications in the industry.

Collaborations

Dalberth has collaborated with notable colleagues, including Michael J Sershen and Ganesh Sundaram. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Mark J Dalberth's contributions to atomic layer deposition technology reflect his dedication to innovation in the field. His patents and career at Ultratech, Inc. highlight his role as a significant inventor in advancing coating methods for substrates.

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