The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2017

Filed:

Dec. 02, 2015
Applicant:

Ultratech, Inc., San Jose, CA (US);

Inventors:

Michael J. Sershen, Cambridge, MA (US);

Ganesh M. Sundaram, Concord, MA (US);

Roger R. Coutu, Hooksett, NH (US);

Jill Svenja Becker, Cambridge, MA (US);

Mark J. Dalberth, Somerville, MA (US);

Assignee:

Ultratech, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/54 (2006.01); C23C 16/453 (2006.01); C23C 16/458 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45574 (2013.01); C23C 16/4412 (2013.01); C23C 16/453 (2013.01); C23C 16/4584 (2013.01); C23C 16/45544 (2013.01); C23C 16/45551 (2013.01); C23C 16/45557 (2013.01); C23C 16/545 (2013.01);
Abstract

An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.


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