This inventor holds 1 USPTO granted patent. Top assignee: Micron Technology Incorporated. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Mark Eyolfsou: Innovator in Material Detection Technology
Introduction
Mark Eyolfsou is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of material detection, particularly in the semiconductor industry. His innovative approach has led to the development of a patented method that enhances the efficiency of material detection processes.
Latest Patents
Mark Eyolfsou holds a patent for a "Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light." This invention provides a method for detecting specific materials, such as photo-resist material, on sample surfaces. The process involves projecting a narrow beam of light onto the sample surface and measuring the fluoresced and/or reflected light intensity at a specific wavelength band using a light detector. The light intensity is then converted into a numerical value and transmitted to a logic circuit, which determines the appropriate handling of the sample. This method is particularly beneficial for detecting photo-resist material on semiconductor wafers.
Career Highlights
Mark Eyolfsou is currently employed at Micron Technology Incorporated, where he applies his expertise in material detection technologies. His work has been instrumental in advancing the capabilities of automated systems in the semiconductor manufacturing process.
Collaborations
Mark has collaborated with notable colleagues, including Elton J Hochhalter and Joe Lee Phillips, to further enhance the development of innovative technologies in his field.
Conclusion
Mark Eyolfsou's contributions to material detection technology exemplify the impact of innovation in the semiconductor industry. His patented methods not only improve detection processes but also pave the way for advancements in automated systems.