Fairport, NY, United States of America

Mark A Lewis


 

 

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 90(Granted Patents)


Company Filing History:


Years Active: 1989-1991

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3 patents (USPTO):Explore Patents

Title: Mark A Lewis: Innovator in Photographic Support Materials

Introduction

Mark A Lewis is a notable inventor based in Fairport, NY (US). He has made significant contributions to the field of photographic support materials, holding a total of 3 patents. His work focuses on enhancing the functionality and performance of photographic elements through innovative materials and processes.

Latest Patents

One of his latest patents is for a photographic support material that comprises an antistatic layer. This invention involves a conventional support, such as polyester film, cellulose acetate film, or resin-coated paper, which features an antistatic layer made of vanadium pentoxide. An overlying barrier layer, composed of a latex polymer with hydrophilic functionality, ensures excellent adhesion between the antistatic layer and other layers, such as silver halide emulsion layers. This combination provides a high level of permanent antistatic protection.

Another significant patent by Lewis describes a vacuum contacting process for photographic elements. This process involves juxtaposing two photographic elements and drawing a vacuum between them. At least one of the elements has been exposed and processed, featuring a support with a matte layer that includes matte particles and a polymeric binder. The innovation lies in utilizing a matte layer with specific characteristics to improve the roughness measurement, enhancing the overall quality of the photographic elements.

Career Highlights

Mark A Lewis is associated with Eastman Kodak Company, a leader in imaging and photographic technology. His work at Kodak has allowed him to contribute to advancements in photographic materials and processes, solidifying his reputation as an innovator in the field.

Collaborations

Throughout his career, Lewis has collaborated with notable coworkers, including Charles Chester Anderson and Diane E Kestner. These collaborations have likely enriched his work and contributed to the development of his patents.

Conclusion

Mark A Lewis is a distinguished inventor whose contributions to photographic support materials have had a lasting impact on the industry. His innovative patents and work at Eastman Kodak Company highlight his commitment to advancing photographic technology.

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