Marjorie Cheng

Title: Marjorie Cheng: Innovator in Critical Dimension Measurement

Introduction

Marjorie Cheng is a notable inventor based in Armonk, NY (US). She has made significant contributions to the field of optical spectrometry and machine learning, particularly in measuring local critical dimension uniformity.

Latest Patents

Cheng holds a patent for a method, system, and non-transitory computer-readable medium for measuring local critical dimension uniformity using scatterometry and machine learning. This innovative approach involves obtaining an acquired optical spectrometry spectrum of an array of two-dimensional structural elements. The process feeds this spectrum into a trained machine learning model, which maps the optical spectrometry spectrum to an average critical dimension (CD) and local critical dimension uniformity (LCDU). The output from this model provides valuable insights into the average CD and LCDU of the array.

Career Highlights

Throughout her career, Marjorie Cheng has worked with prominent companies, including Nova Corporation and International Business Machines Corporation (IBM). Her experience in these organizations has allowed her to develop and refine her innovative techniques in measurement and analysis.

Collaborations

Cheng has collaborated with talented individuals such as Dexin Kong and Daniel Schmidt. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Marjorie Cheng is a pioneering inventor whose work in measuring critical dimension uniformity has the potential to impact various industries. Her innovative methods and collaborations highlight her significant contributions to technology and research.