Mario Putz

Title: Innovator Spotlight: Mario Putz

Introduction:

Meet Mario Putz, an innovative inventor based in Dresden, DE, known for his groundbreaking work in the field of lithographic apparatus. With a keen eye for detail and a passion for technological advancements, Mario has made significant contributions to the industry through his patented invention.

Latest Patents:

Mario Putz currently holds 1 patent for his invention titled "Member with a cleaning surface and a method of removing contamination." This patent showcases his expertise in developing a member with a cleaning surface that effectively captures particles in a lithographic apparatus. The invention utilizes a pattern of projections to capture contaminant particles, with the aid of a sensor for detection.

Career Highlights:

Mario Putz is a valuable member of the innovative team at ASML Netherlands B.V., a renowned company in the tech industry. His work on the patented cleaning surface technology has garnered attention for its efficiency and effectiveness in maintaining the quality of lithographic processes. Mario's dedication to pushing the boundaries of technology has earned him recognition among his peers.

Collaborations:

Throughout his career, Mario Putz has collaborated closely with talented individuals such as Marcus Theodoor Wilhelmus Van Der Heijden and Mark Drewes Boerema. Together, they have worked on refining and enhancing innovative solutions for the lithographic apparatus, contributing to advancements in the industry.

Conclusion:

In conclusion, Mario Putz stands out as a visionary inventor with a knack for developing cutting-edge technologies. His patented invention and contributions at ASML Netherlands B.V. underscore his commitment to driving innovation in the field of lithographic apparatus. Mario's collaborative spirit and passion for invention continue to inspire progress and excellence in the tech industry.