Marina Shiokawa

Title: Innovations of Marina Shiokawa

Introduction

Marina Shiokawa is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. Her work focuses on developing advanced semiconductor devices and display technologies.

Latest Patents

One of her latest patents is for a semiconductor device that includes an oxide semiconductor layer, a gate electrode arranged above the oxide semiconductor layer, and a gate insulation layer between the oxide semiconductor layer and the gate electrode. This innovative design also features a first insulation layer with an aperture, wiring that includes an aluminum layer, and a barrier layer made of aluminum oxide. Another notable patent is for a display device and its manufacturing method, aimed at creating a flexible display device with a resin substrate. This invention enhances the reliability of thin-film transistors (TFTs) by allowing them to be annealed at high temperatures.

Career Highlights

Marina Shiokawa is currently employed at Japan Display Inc., where she continues to push the boundaries of display technology and semiconductor devices. Her work has garnered attention for its potential applications in various electronic devices.

Collaborations

She collaborates with notable colleagues such as Toshinari Sasaki and Hajime Watakabe, contributing to a dynamic research environment that fosters innovation.

Conclusion

Marina Shiokawa's contributions to semiconductor technology and display devices highlight her role as a leading inventor in her field. Her innovative patents reflect her commitment to advancing technology and improving device reliability.